SAN JOSE, Calif.--(EON: Enhanced Online News)--AVACO, specializing in the manufacture of sputtering (PVD) vacuum deposition equipment and atomic layer deposition (ALD) equipment, today announced the development of a new concept buffer layer deposition for photovoltaic. By using AVACO’s atomic layer deposition (ALD) process, the energy conversion efficiency improved to approximately 30% higher than the conventional CIGS solar cell that uses Cds for the buffer layer.
“Expansion of our core technology further strengthens and broadens our offering of deposition process solutions enabling AVACO to continue to provide our customers with innovative and leading-edge technology solutions to address today's manufacturing challenges.”
AVACO’s new ALD process system can provide a solution for buffer layer optimization in the dry process to effectively convert solar energy during photovoltaic development process. The new process enhanced quantum efficiency in both the short wavelength range and near infrared range. The quantum jump in the short circuit current improvement in the I-V curve contributed to higher efficiency CIGS solar cell without affecting the open circuit voltage, Voc. Additionally, we have confirmed that our new buffer layer deposition technique can be applied to a wide range of CIGS absorbers regardless of the preparation methods.
"We are pleased with the latest ALD addition in our system product portfolio,” said Chuck Kim, business development director of AVACO, “Expansion of our core technology further strengthens and broadens our offering of deposition process solutions enabling AVACO to continue to provide our customers with innovative and leading-edge technology solutions to address today's manufacturing challenges."
For more information please visit us at our Booth #751, and/or education poster presentation at Booth #4806, Solar Power International (SPI) 2013 – Chicago. For more information, please visit our website at www.avaco.co.kr/eng.
About AVACO CO. LTD:
AVACO, a publicly traded company headquartered in Daegu, South Korea (KOSDAQ: 083930), is a global supplier of thin-film processing equipment and specializes in the manufacture of sputtering (PVD) vacuum deposition equipment (in-line, cluster, and roll to roll type), atomic layer deposition (ALD) equipment, various BEOL equipment, and factory automation equipment such as clean stocker, clean crane, and overhead transfer system for large-scale substrate.
AVACO is known for delivering proven mass production manufacturing equipment that encompasses all aspects related to thin-film coating such as TCO, metal electrode, and dielectric layer. Target materials used for AVACO’s sputtering system includes Ag, AGZO, Al, Al2O3, AlNd, AZO, CIGS, Cr, Cu, CuGa, CuIn, GZO, IGZO, In, ITO, IZO, Mo, MoTi, MoW, Ni, Se, SiO2, TiO2, ZnO and others with DC, pulsed-DC, and MF utilizing single or dual magnetron source.